Plasma etching : an introduction

edited by Dennis M. Manos, Daniel L. Flamm

Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.

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[目次]

  • D.L. Flamm and G.K. Herb, Plasma Etching Technology. An Overview. D.L. Flamm, Introduction to Plasma Chemistry. S.A. Cohen, An Introduction to Plasma Physics for Materials Processing. D.M. Manos and H.F. Dylla, Diagnostics of Plasmas for Materials Processing. A.R. Reinberg, Plasma Etch Equipment and Technology. J.M.E. Harper, Ion Beam Etching. G.K. Herb, Safety, Health, and Engineering Considerations for Plasma Processing.

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この本の情報

書名 Plasma etching : an introduction
著作者等 Flamm, Daniel L.
Manos, Dennis M.
シリーズ名 Plasma-materials interactions
出版元 Academic Press
刊行年月 c1989
ページ数 xii, 476 p.
大きさ 24 cm
ISBN 0124693709
NCID BA07363130
※クリックでCiNii Booksを表示
言語 英語
出版国 アメリカ合衆国
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